The Challenge:
Consistency At And In The Surface
In polishing, repeatability matters. Semiconductor CMP must be ultra-pure, precisely sized, chemically compatible, and highly consistent. These properties directly impact surface quality, yield, and tool uptime in advanced wafer fabrication.
How We Help:
High-Purity Alumina For Optimal Surface Performance
We build alumina formats designed for polishing systems, from alumina polishing slurries to optical and ceramic finishing. PolarGuard™ alumina meets 4N and 5N purity standards, minimizing metal contaminants like Fe, Na, and Si that can compromise device performance. This protects against ionic contamination and supports defect-free surfaces, critical in sub-10nm nodes.
Moreover, we work with customers to tailor surface characteristics (e.g., charge, dispersibility, functionalization) to ensure compatibility with specific slurry chemistries, helping optimize selectivity and planarity.
PolarGuard is manufactured using a lean, low-emission, high-consistency process with full traceability. Every batch is tested, qualified, and accompanied by detailed specifications and COAs to support fast fab qualification.
Moreover, we work with customers to tailor surface characteristics (e.g., charge, dispersibility, functionalization) to ensure compatibility with specific slurry chemistries, helping optimize selectivity and planarity.
PolarGuard is manufactured using a lean, low-emission, high-consistency process with full traceability. Every batch is tested, qualified, and accompanied by detailed specifications and COAs to support fast fab qualification.
Engineered For Performance. Named For Purpose.
All our materials are part of the PUREGuard™ portfolio—our promise of high-purity, high-integrity alumina designed for critical applications. Within this platform, we’ve developed application-focused product families that make it easy to match the right material to your process.
Alumina for polishing media or abrasive pads. Also available in beads, pellets, and customizable formats. If you don’t find what you need, we can create a custom solution upon request.
Alumina for polishing media or abrasive pads. Also available in beads, pellets, and customizable formats. If you don’t find what you need, we can create a custom solution upon request.
Pure Precision. Proven Performance.
POLARGuard™ products are trusted by customers who need consistent, high-performing alumina to meet polishing specifications.
Clean Surface Results
Submicron particles that reduce scratching and improve finish
Tight PSDs
Every batch is tested for sizing and uniformity
Full Documentation
You’ll get records with sizing, purity, and methods
The Processes We Protect
We supply high-purity alumina tailored for chemical mechanical polishing and advanced surface finishing.
Chemical Mechanical Polishing For Semiconductors
Delivers planarity and performance in the chemical mechanical polishing process used for semiconductor wafers
Optical And Glass Polishing
Fine powders and spherical beads for uniform finish in lenses and displays
Our Process, Your Advantage
We test for size, shape, and surface performance, then back it with data. The result: smoother finishes and fewer surprises.
Frequently Asked Questions
A: In the chemical mechanical polishing process, high-purity alumina ensures consistent removal rates and minimizes surface defects. Its low contamination levels and controlled particle size help maintain uniformity across wafers and reduce variability in precision applications.
A: Our powders are used in chemical mechanical polishing (CMP), precision optical polishing, and other advanced surface finishing applications that require low-defect, high-uniformity results.
A: We offer tight particle size distributions in submicron ranges to ensure smooth finishes and reduced scratching. Custom PSDs can be developed to match specific slurry or pad conditions.
A: Yes. Our materials are designed for low metallic impurity levels to avoid surface damage and maintain uniform removal rates, critical in semiconductor use.
A: Absolutely. We work with customers to align on purity, particle size, and distribution specs to support their exact CMP or surface prep conditions.
A: We primarily offer powder formats for polishing, optimized for slurry dispersion and stable performance. Technical documentation is provided with every batch.